Imaging interferometric lithography ( iil ) transfers different components of spatial frequencies through the same limited aperture at different time to enhance the resolution power of lithography with increasing less cost of system 摘要掩模投影成像干涉光刻技术以在很小或几乎不增加光刻系统成本的基础上来提高光刻分辨率为目的，充分利用系统的有限孔径，将掩模图形不同的空间频率分别进行传递，最终以高分辨率对掩模成像。
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The algorithm only needs to solve an ill - posed linear system and a well - posed minimization problem and requires only the knowledge of the near field measurements of the scattered fields due to point source fields at a finite number of incidence and observation points distributed over a limited aperture 该算法只需求解一个不适定的线性系和一个适定的非线性最小化问题，而且只需要点源入射场的散射场在某个有限孔径中若干有限个入射和测量点上的近场测量信息。
